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The 16th conference on Defects-Recognition, Imaging and Physics in Semiconductors (DRIP XVI)
Author: SINANO
Update time: 2015-01-16
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The 16th conference on Defects-Recognition, Imaging and Physics in Semiconductors (DRIP XVI) will be held Sept 6-10, 2015 in Suzhou, China. It is organized by Suzhou Institute of Nano-tech and Nano-bionics. The first DRIP was held in Montpelier in 1985, established by Prof. J. P. Fillard, and since that time a series of 15 conferences have been held in Europe, Asia and America. It has filled a unique niche in the physics of semiconductor defects, focusing on all aspects, including point, line, planar and volume defects studied by a variety of techniques. Welcome to participate!

 

 

For Meeting Inquiries

 Email: drip16@163.com

Websitehttp://dripxvi.csp.escience.cn/

Address: No. 398 Ruoshui Road,  Suzhou Industrial Park, Suzhou, Jiangsu Province, 215123, China

 

 

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