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China-French-Nano-X Workshop
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Update time: 2018-11-06
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DateNovember 6th, 2018

PlaceNano-X  1-210 Meeting Room

Session Chair: Chunping JIANG

Time

Content

Reporter

08:30-08:35

Welcome address

Hui YANG

08:35-09:05

Presentation of the platform Danm

Nitride thin films deposited by reactive sputtering

J.F. Pierson/

Danielle PIERRE

09:05-09:35

Nano-X Introduction and Electronic Structure and Enhanced Charge-Density Wave Order of Monolayer VSe2

Jiagui FENG

09:35-09:55

Development of GaN-based laser diodes

Jianping LIU

09:55-10:25

Coffee Break

 

10:25-10:45

Electrical Initialization of Electron and Nuclear Spins in a Single Quantum Dot at Zero Magnetic Field

Yuan LU

10:45-11:05

Quasi one-dimensional band dispersion and surface metallization in long-range ordered polymeric wires

Yannic Fagot-Revurat

 

11:05-11:25

Organic Superconductors

Fangsen LI

11:25-11:45

New semiconductors for next generation optoelectronics & energy harvesting

 Patrice MISKA

12:00

Lunch

 

14:00-14:30

Visit Nano-X

 

14:30-15:30

Discuss

 

China-French-Nano-X Workshop

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