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LAB Equipment of Nanofabrication Facility
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Update time: 2015-04-29
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E-Beam Lithography (JBX5500ZA) Stepper (NSR1755i7B) Photo Lithography (SUSS MA6/BA6)
Bonder (SUSS CB6L) E-Beam Evaporator (ULVAC Ei-5z) PECVD (OXFORD SYSTEM 100)
Sputter (Kurt J. Lesker LAB-18) Optical (Coating Machine (OTFC-900) Advanced Silicon Etcher (STS MPXHRM)
III-V ICP Plasma Etcher (OXFORD ICP 180) Ion Beam Etching System (150A) CMP (AL-380L/P)
Flip chip Bonder (FC150) Laser scriber (New Wave Titan) West Bond (747677E)
Solder Reflow OVEN (SRO-702-R) Scanning Electron Microscopy (JSM6390) Surface Profiler (DEKTAK 150)
X-ray Inspection system (XTV160) Scanning Acoustic Microscope (D9500) Focused Ion beam (FEI XL830)
Ion Implanting System (NV-GSD-HE) The Parallel Seam Sealing System (SM8500) Laser Dicing Machine (ML200plus)
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