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LAB Equipment of Nanofabrication Facility
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Update time:
2015-04-29
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E-Beam Lithography (JBX5500ZA)
Stepper (NSR1755i7B)
Photo Lithography (SUSS MA6/BA6)
Bonder (SUSS CB6L)
E-Beam Evaporator (ULVAC Ei-5z)
PECVD (OXFORD SYSTEM 100)
Sputter (Kurt J. Lesker LAB-18)
Optical (Coating Machine (OTFC-900)
Advanced Silicon Etcher (STS MPXHRM)
III-V ICP Plasma Etcher (OXFORD ICP 180)
Ion Beam Etching System (150A)
CMP (AL-380L/P)
Flip chip Bonder (FC150)
Laser scriber (New Wave Titan)
West Bond (747677E)
Solder Reflow OVEN (SRO-702-R)
Scanning Electron Microscopy (JSM6390)
Surface Profiler (DEKTAK 150)
X-ray Inspection system (XTV160)
Scanning Acoustic Microscope (D9500)
Focused Ion beam (FEI XL830)
Ion Implanting System (NV-GSD-HE)
The Parallel Seam Sealing System (SM8500)
Laser Dicing Machine (ML200plus)
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