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Z. Zhang, R.E. Stahlbush, P. Pirouz and T.S. Sudarshan, “Characteristics of Dislocation Half-Loop Arrays in 4H-SiC Homo-Epilayer,” J. Electronic Materials, Vol 36(5), 539-542 (2007)
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Z. Zhang, Moulton, E. T. S. Sudarshan, “Mechanism of eliminating basal plane dislocations in SiC thin films by epitaxy on an etched substrate”, Appl. Phys. Lett. 89, 081910 (2006).
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Z. Zhang, S. I. Maximenko, A. Shrivastava, P. Sadagopan, Y. Gao and T. S. Sudarshan, “Propagation of stacking faults from surface damage in SiC PiN diodes”, Appl. Phys. Lett. 88, 062101 (2006).
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Z. Zhang and T. S. Sudarshan, “Growth of Low Basal Plane Dislocation Density SiC Epitaxial Layers ”, Mater. Sci. Forum Vol 527-529, 243(2006).
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Z. Zhang, A. Shrivastava and T. S. Sudarshan, “Why Are Only Some Basal Plane Dislocations Converted to Threading Edge Dislocations During SiC Epitaxy”, Mater. Sci. Forum Vol 527-529, 419 (2006).
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Z. Zhang, A. E. Grekov, P. Sadagopan, S. I. Maximenko, and T. S. Sudarshan, “Performance of SiC PiN diodes fabricated on basal plane dislocation-free SiC epilayers”, Mater. Sci. Forum Vol 527-529, 371 (2006).
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Z. Zhang and T. S. Sudarshan, “Basal plane dislocation-free epitaxy of silicon carbide”, Appl. Phys. Lett. 87, 151903(2005).
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Z. Zhang and T. S. Sudarshan, “Evolution of basal plane dislocations during 4H-silicon carbide homo-epitaxy”, Appl. Phys. Lett. 87, 161917(2005).
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Z. Zhang, Y. Gao, A. C. Arjunan, E. Y. Toupitsyn, P. Sadagopan, R. Kennedy, and T. S. Sudarshan, “CVD growth and characterization of 4H-SiC epitaxial film on as-cut (11-20) substrates”, Mater. Sci. Forum 483-485, 113(2005).
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Z. Zhang, Y. Gao, and T. S. Sudarshan, “Delineating structural defects in highly doped n-type 4H-SiC Substrates using a combination of thermal diffusion and molten KOH etching”, Electrochem. Solid-State Lett. 7, G264 (2004).
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张泽洪, 沈小明, 冯志洪, 冯赣, 付翌, 张宝顺, 孙元平, 杨辉, "Pt/n-GaN 肖特基接触的热回火行为研究", 半导体学报 (2002).
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张泽洪, 赵德刚, 孙元平, 冯志洪, 沈小明, 张宝顺, 冯赣, 郑新和, 朱建军, 王玉田, 杨辉, "立方相GaN的持续光电导研究", 半导体学报 (2002).